The generation of nano-patterns on a pure silicon wafer in air and argon with sub-diffraction limit nanosecond laser pulses

Journal of Physics D: Applied Physics

Volumn 43, Issue 14, 2010, Pages

  Soni, Alok ^a   Sundaram, Vijay M ^a   Wen, Sy Bor ^a  

^a Department of Electrical and Computer Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIRECT-PATTERNING; FEMTO-SECOND LASER; LASER ENERGIES; NANO PATTERN; NANO SCALE; NANOSCALE LASERS; NANOSECOND LASER PULSE; NEAR-FIELD SCANNING OPTICAL MICROSCOPE; NSOM PROBES; PURE SILICON; RECRYSTALLIZATIONS; SI WAFER; SUB-DIFFRACTION LIMIT;

ABLATION; ARGON; ELECTROMAGNETIC WAVE DIFFRACTION; LASER PULSES; NANOSTRUCTURED MATERIALS; NEAR FIELD SCANNING OPTICAL MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON OXIDES; SILICON WAFERS;

PULSED LASER APPLICATIONS;

EID: 77949887281     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/43/14/145301     Document Type: Article

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