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Volumn 23, Issue 4-6 SPEC. ISS., 2005, Pages 317-321

Development of moderate temperature CVD Al2O3 coatings

Author keywords

Al2O3; Chemical vapor deposition (CVD); Cutting tools; Medium temperature; Thermodynamics

Indexed keywords

ALUMINA; CHEMICAL VAPOR DEPOSITION; CUTTING TOOLS; OXYGEN; THERMODYNAMICS;

EID: 24044467396     PISSN: 02634368     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijrmhm.2005.05.017     Document Type: Conference Paper
Times cited : (16)

References (26)
  • 9
    • 33645485508 scopus 로고
    • Bloem J, Verspui G, Wolff LR, editors, The Netherlands
    • Schmitt T, Altena H, Lux B. In: Bloem J, Verspui G, Wolff LR, editors. Proc 4th Eur Conf CVD, The Netherlands, 1983. p. 421.
    • (1983) Proc 4th Eur Conf CVD , pp. 421
    • Schmitt, T.1    Altena, H.2    Lux, B.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.