Comparative study of resistivity characteristics between transparent conducting AZO and GZO thin films for use at high temperatures

Thin Solid Films

Volumn 518, Issue 11, 2010, Pages 2937-2940

  Nomoto, Jun ichi ^a   Konagai, Manabu ^a   Okada, Kenji ^a   Ito, Tomoyuki ^a   Miyata, Toshihiro ^a   Minami, Tadatsugu ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

AZO; GZO; Heat stability tests; Magnetron sputtering deposition; Pulsed laser deposition; Thin film; Transparent electrode; Vacuum arc plasma evaporation

Indexed keywords

GZO; HEAT STABILITY; HEAT STABILITY TESTS; MAGNETRON-SPUTTERING DEPOSITION; TRANSPARENT ELECTRODE; VACUUM ARC PLASMA EVAPORATION;

CAVITY RESONATORS; CONDUCTIVE FILMS; FILM PREPARATION; GALLIUM; GALVANOMAGNETIC EFFECTS; GLASS LASERS; HALL MOBILITY; HEAT RESISTANCE; MAGNETRONS; PLASMA DEPOSITION; PLASMA STABILITY; PULSED LASER DEPOSITION; PULSED LASERS; THIN FILM DEVICES; THIN FILMS; VACUUM; VACUUM EVAPORATION; VAPOR DEPOSITION; VAPORS; ZINC OXIDE;

DEPOSITION;

EID: 77649133405     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.10.134     Document Type: Article

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