Preparation of impurity-doped ZnO transparent electrodes suitable for LCD applications by magnetron sputtering

IDW '08 - Proceedings of the 15th International Display Workshops

Volumn 3, Issue , 2008, Pages 1833-1836

  Nomoto, Junichi ^a   Konagai, Manabu ^a   Oda, Junichi ^a   Fukada, Haruki ^a   Miyata, Toshihiro ^a   Minami, Tadatsugu ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CO-DOPING; DC MAGNETRON SPUTTERING; DOPED ZNO; HIGH-HUMIDITY ENVIRONMENT; OXIDIZATION; RELATIVE HUMIDITIES; RESISTIVITY DISTRIBUTIONS; RF-POWER; TRANSPARENT ELECTRODE;

ATMOSPHERIC HUMIDITY; DC POWER TRANSMISSION; DOPING (ADDITIVES); LIQUID CRYSTAL DISPLAYS; METALLIC FILMS; MOISTURE; OPTICAL FILMS; THIN FILMS; ZINC OXIDE;

FILM PREPARATION;

EID: 77954127738     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)

1. T. Minami and T.Miyata, Thin Solid Films, available online Sept. 24, (2008).
2. T. Minami, MRS Bull. 25 (2000) 38.
3. T. Minami, Semicond. Sci. Technol. 20 (2005) S35.
4. T. Minami, Thin Solid Films, 516 (2008) 1314.
5. T. Minami, Thin Solid Films, 516 (2008) 5822.
6. T. Minami, T. Miyata, Y. Ohtani, and Y. Mochizuki, Jpn. J. Appl. Phys. 45 (2006) L409.
7. T. Minami, T. Miyata, Y. Ohtani, and T. Kuboi, phy. stat. sol. (RRL) 1(2007) R31.