SCOPUS 정보 검색 플랫폼

Volumn 87, Issue 5-8, 2010, Pages 1062-1065

Charged Particle Nanopatterning (CHARPAN) of 2D and 3D masters for flexible replication in Substrate Conformal Imprint Lithography (SCIL)

(5) van Delft, Falco a van de Laar, Robert a Verschuuren, Marc a Platzgummer, Elmar b Loeschner, Hans b

a PHILIPS RESEARCH LABORATORIES (Netherlands)

b IMS NANOFABRICATION AG (Austria)

Author keywords

CHARPAN, Charged Particle Nanopatterning; HSQ, Hydrogen Silsesquioxane; SCIL, Substrate Conformal Imprint Lithography

Indexed keywords

HYDROGEN SILSESQUIOXANE; IMPRINT LITHOGRAPHY; NANOPATTERNING; SCIL, SUBSTRATE CONFORMAL IMPRINT LITHOGRAPHY;

CHARGED PARTICLES; ELECTRON BEAM LITHOGRAPHY; HYDROGEN; MICROCHANNELS; NANOIMPRINT LITHOGRAPHY; POSITION CONTROL; SILICONES; THREE DIMENSIONAL; XENON;

SUBSTRATES;

EID: 76949095500 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/j.mee.2009.11.088 Document Type: Article

Times cited : (8)

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