Charged particle nanopatterning

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 2707-2710

  Platzgummer, Elmar ^a   Loeschner, Hans ^a  

^a IMS NANOFABRICATION AG   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

APERTURE PLATE; COMPLEMENTARY METAL OXIDE SEMICONDUCTORS; ION PROJECTION; LEADING EDGE; MASK LESS; MULTI-BEAM; NANO-IMPRINT; NANOPATTERNING; NANOPATTERNING TECHNIQUES; NM RESOLUTION; OPTICAL REDUCTION; PROJECTION TECHNIQUES; PROOF OF CONCEPT; RESEARCH AND DEVELOPMENT; RESISTLESS TECHNIQUE; SWITCHABLE;

ACOUSTIC ARRAYS; IONS; METALLIC COMPOUNDS; MOS DEVICES; PLATE METAL; RESEARCH AND DEVELOPMENT MANAGEMENT;

NANOSYSTEMS;

EID: 72849147832     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3243166     Document Type: Conference Paper

References (3)

1. Elmar Platzgummer, Hans Loeschner, and Gerhard Gross, J. Vac. Sci. Technol. B 26, 2059 (2008).
2. Florian Letzkus, Mathias Irmscher, Michael Jurisch, Elmar Platzgummer, Christof Klein, and Hans Loeschner, presented at SPIE Photomask BACUS 2009, Monterey, CA, 15-17 September 2009 (unpublished), Paper No. 7488-123.
3. Joerg Butschke, Mathias Irmscher, Holger Sailer, Hans Loeschner, and Elmar Platzgummer, Proc. SPIE 7379, 73792O (2009).