Iteratively derived optical constants of MoO3 polycrystalline thin films prepared by CVD

Thin Solid Films

Volumn 304, Issue 1-2, 1997, Pages 39-44

  Abdellaoui, A ^a   Leveque G ^b   Donnadieu, A ^c   Bath, A ^d   Bouchikhi, B ^a  

^a MOULAY ISMAIL UNIVERSITY   (Morocco)

^b UNIVERSITÉ MONTPELLIER II   (France)

^c Lab d'Electrooptique Couches M   (France)

^d SUPELEC   (France)

Author keywords

Chemical vapour deposition; Molybdenum oxide; Optical properties; Oxides

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; ELECTROCHROMISM; ITERATIVE METHODS; MATHEMATICAL MODELS; MOLYBDENUM COMPOUNDS; OXIDATION; POLYCRYSTALLINE MATERIALS;

FRESNEL LAWS; MOLYBDENUM OXIDES;

THIN FILMS;

EID: 0031186175     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00092-8     Document Type: Article

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