Graded composition and valence states in self-forming barrier layers at Cu-Mn/ SiO2 interface

Applied Physics Letters

Volumn 96, Issue 1, 2010, Pages

  Otsuka, Y ^a   Koike, J ^b   Sako, H ^a   Ishibashi, K ^a   Kawasaki, N ^a   Chung, S M ^b   Tanaka, I ^c  

^a TORAY RESEARCH CENTER INC   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

^c KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BARRIER LAYERS; CHEMICAL COMPOSITIONS; DIELECTRIC CONSTANTS; GRADED COMPOSITION; LAYERED STRUCTURES; NANOCRYSTALLINES; SELF-FORMING DIFFUSION; SPATIAL VARIATIONS; SUBNANOMETER RESOLUTION; VALENCE STATE;

CHEMICAL ELEMENTS; ENERGY DISSIPATION; MANGANESE; MANGANESE OXIDE; SILICON COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY;

ELECTRON ENERGY LOSS SPECTROSCOPY;

EID: 75749123033     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3269602     Document Type: Article

References (23)

1. A. E. Kaloyeros and E. Eisenbraun, Annu. Rev. Mater. Sci. ARMSCX 0084-6600 30, 363 (2000). 10.1146/annurev.matsci.30.1.363 (Pubitemid 30957536)
2. C. J. Liu, J. S. Jeng, J. S. Chen, and Y. K. Lin, J. Vac. Sci. Technol. B JVTBD9 1071-1023 20, 2361 (2002). 10.1116/1.1520552
3. J. Koike and M. Wada, Appl. Phys. Lett. APPLAB 0003-6951 87, 041911 (2005). 10.1063/1.1993759 (Pubitemid 41117959)
4. K. Barmak, C. Cabral, Jr., K. P. Rodbell, and J. M. E. Harper, J. Vac. Sci. Technol. B JVTBD9 1071-1023 24, 2485 (2006). 10.1116/1.2357744 (Pubitemid 44866365)
5. S. Tsukimoto, T. Kabe, K. Ito, and M. Murakami, J. Electron. Mater. JECMA5 0361-5235 36, 258 (2007). 10.1007/s11664-007-0094-8 (Pubitemid 46675348)
6. K. Ito, S. Tsukimoto, T. Kabe, K. Tada, and M. Murakami, J. Electron. Mater. JECMA5 0361-5235 36, 606 (2007). 10.1007/s11664-007-0097-5 (Pubitemid 46790870)
7. M. Haneda, J. Iijima, and J. Koike, Appl. Phys. Lett. APPLAB 0003-6951 90, 252107 (2007). 10.1063/1.2750402 (Pubitemid 47141206)
8. T. Usui, H. Nasu, S. Takahashi, N. Shimizu, T. Nishikawa, M. Yoshimaru, H. Shibata, M. Wada, and J. Koike, IEEE Trans. Electron Devices IETDAI 0018-9383 53, 2492 (2006). 10.1109/TED.2006.882046
9. J. Koike, M. Haneda, J. Iijima, Y. Otsuka, H. Sako, and K. Neishi, J. Appl. Phys. JAPIAU 0021-8979 102, 043527 (2007). 10.1063/1.2773699 (Pubitemid 47352423)
10. J. Iijima, Y. Fujii, K. Neishi, and J. Koike, J. Vac. Sci. Technol. B JVTBD9 1071-1023 27, 1963 (2009). 10.1116/1.3179167
11. L. Zhao, Zs. Tokei, G. G. Gischia, H. Volders, and G. P. Beyer, Proceedings of the 2009 International Interconnect Technologies Conference, 2009 (unpublished), p. 206.
12. S. M. Chung and J. Koike, J. Vac. Sci. Technol. B JVTBD9 1071-1023 27, L28 (2009). 10.1116/1.3224884
13. J. M. Ablett, J. C. Woicik, Zs. Tokei, S. List, and E. Dimasi, Appl. Phys. Lett. APPLAB 0003-6951 94, 042112 (2009). 10.1063/1.3068500
14. R. F. Egerton, Electron Energy Loss Spectroscopy in the Transmission Electron Microscope (Plenum, New York, 1996).
15. D. B. Williams and C. B. Carter, Transmission Electron Microscopy (Plenum, New York, 1996).
16. H. Kurata and C. Colliex, Phys. Rev. B PRBMDO 0163-1829 48, 2102 (1993). 10.1103/PhysRevB.48.2102
17. T. Riedl, T. Gemming, W. Gruner, J. Acker, and K. Wetzig, Micron MCONEN 0968-4328 38, 224 (2007). 10.1016/j.micron.2006.06.017 (Pubitemid 46027606)
18. T. Riedl, T. Gemming, and K. Wetzig, Ultramicroscopy ULTRD6 0304-3991 106, 284 (2006). 10.1016/j.ultramic.2005.09.002 (Pubitemid 43287014)
19. L. A. J. Garvie and A. J. Craven, Ultramicroscopy ULTRD6 0304-3991 54, 83 (1994). 10.1016/0304-3991(94)90094-9
20. A. K. Chaudhury and K. V. Rao, Phys. Status Solidi B PSSBBD 0370-1972 32, 731 (1969). 10.1002/pssb.19690320225
21. J. L. Rosenholtz and D. T. Smith, Am. Mineral. AMMIAY 0003-004X 21, 115 (1936).
22. J. H. Paterson and O. L. Krivanek, Ultramicroscopy ULTRD6 0304-3991 32, 319 (1990). 10.1016/0304-3991(90)90078-Z (Pubitemid 20253962)
23. D. B. Loomer, T. A. Al, L. Weaver, and S. Cogswell, Am. Mineral. AMMIAY 0003-004X 92, 72 (2007). 10.2138/am.2007.2252 (Pubitemid 46139555)