Effects of substrate materials on self-formation of Ti-rich interface layers in Cu(Ti) alloy films

Journal of Electronic Materials

Volumn 36, Issue 5, 2007, Pages 606-613

  Ito, K ^a   Tsukimoto, S ^a   Kabe, T ^a   Tada, K ^a   Murakami, M ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Barrier layer; Cu(Ti) alloy film; Reaction; Resistivity; Self formation

Indexed keywords

ALLOY FILMS; BARRIER LAYERS; SELF FORMATION; SUBSTRATE MATERIALS;

COPPER ALLOYS; ELECTRONIC STRUCTURE; LSI CIRCUITS; RAPID THERMAL ANNEALING; SUBSTRATES; TITANIUM;

INTERFACES (MATERIALS);

EID: 34249077946     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-007-0097-5     Document Type: Article

References (18)

1. S.P. Murarka, Mater. Sci. Eng. R. 19, 87 (1997).
2. The International Technology Roadmap for Semiconductors (ITRS), http://www.itrs.net/Links/2003ITRS/Interconnect2003.pdf, 2003.
3. M.T. Bohr and Y.A. El-Mansy, IEEE Trans. Electron. Dev. 45, 620 (1998).
4. S.P. Murarka, Mater. Sci. Technol. 17, 479 (2001).
5. Y. Morand, Microelectron. Eng. 50, 391 (2000).
6. M. Moriyama, K. Matsunaga, and M, Murakami, J. Electron. Mater. 32, 261 (2003).
7. M. Moriyama, K. Matsunaga, T. Morita, S. Tsukimot, and M. Murakami, Mater. Trans. 45, 3033 (2004).
8. M. Murakami, M. Moriyama, S. Tsukimoto, and K. Ito, Mater. Trans. 46, 1737 (2005).
9. M. Moriyama, M, Shimada, H, Masuda, and M. Murakami, Trans. Mater. Res. Soc. Jpn. 29, 51 (2004).
10. M. Shimada, M. Moriyama, K. Ito, S. Tsukimoto, and M. Murakami, J. Vac. Sci. Technol. B 24, 190 (2006).
11. P.J. Ding, W.A. Lanford, S. Hymes, and S.P. Murarka, J. Appl. Phys. 75, 3627 (1994).
12. D. Adams, T.L. Alford, N.D. Theodore, S.W. Russell, R.L. Spreitzer, and J.W. Mayer, Thin Solid Films 262, 199 (1995).
13. C.J. Liu and J.S. Chen, Appl. Phys. Lett. 80, 2678 (2002).
14. C.J. Liu, J.S. Jeng, J.S. Chen, and Y.K. Lin, J. Vac. Sci. Technol. B 20, 2361 (2002).
15. M.J. Frederick, R. Goswami, and G. Ramanath, J. Appl. Phys. 93, 5966 (2003).
16. M.J. Frederick and G. Ramanath, J. Appl. Phys. 95, 3202 (2004).
17. S. Tsukimoto, T. Morita, M. Moriyama, K. Ito, and M. Murakami, J. Electron. Mater. 34, 592 (2005).
18. Y. Waseda ed., Metal Databank, 4th ed. (Japan Institute of Metal, 2004), p. 101 (in Japanese).