Phase identification of self-forming Cu-Mn based diffusion barriers on p-SiOC:H and SiO2 dielectrics using x-ray absorption fine structure

Applied Physics Letters

Volumn 94, Issue 4, 2009, Pages

  Ablett, J M ^a   Woicik, J C ^b   Tokei Zs ^c   List, S ^d   Dimasi, E ^e  

^a SYNCHROTRON SOLEIL   (France)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^c IMEC   (Belgium)

^d INTEL CORPORATION   (United States)

^e BROOKHAVEN NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; ABSORPTION SPECTROSCOPY; CHEMICAL PROPERTIES; COPPER ALLOYS; DIFFUSION BARRIERS; ELECTROMAGNETIC WAVE ABSORPTION; ENERGY ABSORPTION; FILM GROWTH; MANGANESE; MANGANESE COMPOUNDS; METALLIC FILMS; PHASE INTERFACES; SILICON COMPOUNDS; STRUCTURAL PROPERTIES; X RAY ABSORPTION; X RAY ABSORPTION FINE STRUCTURE SPECTROSCOPY;

ALLOY FILMS; FORMING PROCESS; MN ALLOY FILMS; PHASE IDENTIFICATIONS; POROUS LOW-K; SELF-FORMING DIFFUSIONS; X-RAY ABSORPTION FINE STRUCTURE SPECTROSCOPIES; X-RAY ABSORPTION FINE STRUCTURES;

COPPER;

EID: 59349083002     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3068500     Document Type: Article

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