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Volumn 176, Issue 1, 2003, Pages 37-49

Investigations on nitrogen addition in the CH4-H2 gas mixture used for diamond deposition for a better understanding and the optimisation of the synthesis process

(6) Benedic F a Belmahi, M a Elmazria, O a Assouar, M B a Fundenberger, J J b Alnot, P a

a INSTITUT JEAN LAMOUR (France)

b UNIVERSITÉ PAUL VERLAINE METZ (France)

Author keywords

CVD; Diamond; Microwave plasma; Nitrogen; Thin films

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; HYDROGEN; NITROGEN; PROFILOMETRY; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SYNTHESIS (CHEMICAL); X RAY DIFFRACTION;

GAS MIXTURE;

METHANE;

DIAMOND;

EID: 7544241147 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(03)00022-7 Document Type: Article

Times cited : (15)

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