Intrinsic stress evolution in diamond films prepared in a CH4-H2-NH3 hot filament chemical vapor deposition system

Diamond and Related Materials

Volumn 9, Issue 7, 2000, Pages 1388-1392

  Shang, N G ^a   Lee, C S ^a   Lin, Z D ^a   Bello, I ^a   Lee, S T ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Ammonia; Diamond; HFCVD; Intrinsic stress

Indexed keywords

AMMONIA; CHEMICAL VAPOR DEPOSITION; COMPRESSIVE STRESS; FILM PREPARATION; STRESS RELAXATION; TENSILE STRESS;

HOT FILAMENT CHEMICAL VAPOR DEPOSITION; INTRINSIC STRESS;

DIAMOND FILMS;

EID: 0033688526     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(00)00265-X     Document Type: Article

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