Combined effect of nitrogen and pulsed microwave plasma on diamond growth using CH4-CO2 gas mixture

Thin Solid Films

Volumn 325, Issue 1-2, 1998, Pages 7-13

  Bougdira, Jamal ^a   Remy, Michel ^a   Alnot, Patrick ^a   Bruch, Christian ^b   Kruger, Jan K ^b   Chatei, Hassan ^c   Derkaoui, Jamal ^c  

^a INSTITUT JEAN LAMOUR   (France)

^b SAARLAND UNIVERSITY   (Germany)

^c FACULTÉ DES SCIENCES   (Morocco)

Author keywords

Carbon dioxide; Diamond; Nitrogen; Plasma processing and deposition

Indexed keywords

CARBON MONOXIDE; EMISSION SPECTROSCOPY; GRAPHITE; MICROWAVES; NITROGEN; PLASMA APPLICATIONS; SEMICONDUCTOR GROWTH;

TIME RESOLVED OPTICAL EMISSION SPECTROSCOPY;

SEMICONDUCTING DIAMONDS;

EID: 0032115404     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00955-3     Document Type: Article

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