Generic nano-imprint process for fabrication of nanowire arrays

Nanotechnology

Volumn 21, Issue 6, 2010, Pages

  Pierret, Aurélie ^a   Hocevar, Mora ^a,b   Diedenhofen, Silke L ^a   Algra, Rienk E ^a,c,d   Vlieg, E ^d   Timmering, Eugene C ^a   Verschuuren, Marc A ^a   Immink, George W G ^a   Verheijen, Marcel A ^a   Bakkers, Erik P A M ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^c MATERIALS INNOVATION INSTITUTE M2I   (Netherlands)

^d RADBOUD UNIVERSITY NIJMEGEN   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

A-THERMAL; DEFECT-FREE ARRAYS; E-BEAM LITHOGRAPHY; GENERIC PROCESS; GOLD PARTICLE ARRAYS; INP; NANO-IMPRINT; NANOWIRE ARRAYS; ORGANIC RESIDUES; PIRANHA SOLUTIONS; UNIFORM NANOWIRES;

CHEMICAL CLEANING; GALLIUM ALLOYS; NANOIMPRINT LITHOGRAPHY;

NANOWIRES;

EID: 75249091313     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/21/6/065305     Document Type: Article

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