Enhanced transmittance of glass plates for solar cells using nano-imprint lithography

Solar Energy Materials and Solar Cells

Volumn 94, Issue 3, 2010, Pages 583-587

  Han, Kang Soo ^a   Shin, Ju Hyeon ^a   Lee, Heon ^a  

^a Korea University   (South Korea)

Author keywords

Anti reflection; Moth eye; Nano imprint lithography; Quantum efficiency; Transmittance

Indexed keywords

ANTI-REFLECTION; EFFECTIVE REFRACTIVE INDEX; GLASS PLATE; MOTHEYE; NANO PATTERN; NANO-METER SCALE; POLYMER PATTERNS; PROTECTIVE LAYERS; REFLECTION OF LIGHT; SURFACE CHANGES; WAVELENGTH OF LIGHT;

CONVERSION EFFICIENCY; GLASS; LIGHT REFLECTION; QUANTUM EFFICIENCY; REFLECTION; REFRACTIVE INDEX; SEMICONDUCTOR QUANTUM DOTS; SOLAR CELLS;

NANOIMPRINT LITHOGRAPHY;

EID: 75149188245     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2009.12.001     Document Type: Article

References (19)

1. Jorgensen G.J., Terwilliger K.M., DelCueto J.A., Glick S.H., Kempe M.D., Pankow J.W., Pern F.J., and McMahon T.J. Moisture transport, adhesion, and corrosion protection of PV module packaging materials. Sol. Energy Mater. Sol. Cells 90 (2006) 2739-2775
2. Shibata N. Plasma-chemical vapor-deposited silicon oxide/silicon oxynitride double-layer antireflective coating for solar cells. Jpn. J. Appl. Phys. 30 (1991) 997-1001
3. Zhao J., and Green M.A. Optimized antireflection coatings for high-efficiency silicon solar cells. IEEE Trans. Electron Dev. 38 (1991) 1925-1934
4. Bernhard C.G. Structural and functional adaptation in a visual system. Endeavour 26 (1967) 79-84
5. Clapham P.B., and Hutley M.C. Reduction of lens reflexion by the 'moth eye' principle. Nature 244 (1973) 281-282
6. Linn N.C., Sun C.H., Jiang P., and Jiang B. Self-assembled biomimetic antireflection coatings. Appl. Phys. Lett. 91 (2007) 101108-1-101108-3
7. Min W.L., Betancourt A.P., Jiang P., and Jiang B. Bioinspired broadband antireflection coatings on GaSb. Appl. Phys. Lett. 92 (2008) 141109-1-141109-3
8. Sun C.H., Jiang P., and Jiang B. Broadband moth-eye antireflection coatings on silicon. Appl. Phys. Lett. 92 (2008) 061112-1-061112-3
9. Liu K., Avouris P., Bucchignano J., Martel R., Sun S., and Michl J. Simple fabrication scheme for sub-10 nm electrode gaps using electron-beam lithography. Appl. Phys. Lett. 80 (2002) 865-1-865-3
10. Levenson M.D., Viswanathan N.S., and Simpson R.A. Improving resolution in photolithography with a phase-shifting mask. IEEE Trans. Electron Dev. 29 (1982) 1828-1836
11. Hulteen J.C., and Van Duyne R.P. Nanosphere lithography: a materials general fabrication process for periodic particle array surfaces. J. Vac. Sci. Technol. A 13 (1995) 1553-1558
12. Chou S.Y., Krauss P.R., and Renstrom P.J. Imprint of sub-25 nm vias and trenches in polymers. Appl. Phys. Lett. 67 (1995) 3114-3116
13. Chou S.Y., and Krauss P.R. Imprint lithography with sub-10 nm feature size and high throughput. Microelectron. Eng. 35 (1997) 237-240
14. Lee H., Hong S.H., Yang K.Y., and Choi K.W. Fabrication of 100 nm metal lines on flexible plastic substrate using ultraviolet curing nanoimprint lithography. Appl. Phys. Lett. 88 (2006) 143112-1-143112-3
15. Lee H., Hong S., Yang K., and Choi K. Fabrication of nano-sized resist patterns on flexible plastic film using thermal curing nano-imprint lithography. Microelectron. Eng. 83 (2006) 323-327
16. Heckele M., Bacher W., and Müller K.D. Hot embossing-the molding technique for plastic microstructures. Microsyst. Technol. 4 (1998) 122-124
17. Hong S.H., Lee J.H., and Lee H. Fabrication of 50 nm patterned nickel stamp with hot embossing and electroforming process. Microelectron. Eng. 84 (2007) 977-979
18. K.S. Han, H.J. Lee, D.H. Kim, H. Lee, Fabrication of anti-reflection structure on protective layer of solar cells by hot embossing method, Sol. Energy Mater. Sol. Cells, accepted 93 (2009) 1214-1217
19. Lee H., and Jung G.Y. Wafer to wafer nano-imprinting lithography with monomer based thermally curable resin. Microelectron. Eng. 77 (2005) 168-174