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Volumn 48, Issue 12, 2009, Pages

Improvement in electrical characteristics of low-pressure chemical-vapor-deposited SiNx dielectric layer on GaN substrate by ammonium sulfide treatment

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIUM SULFIDE; DIELECTRIC LAYER; EFFECTIVE OXIDE CHARGE; ELECTRICAL CHARACTERISTIC; FILM QUALITY; GAN SUBSTRATE;

EID: 75149170451     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.48.120202     Document Type: Article
Times cited : (6)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.