A novel printing technique for highly integrated organic devices

Microelectronic Engineering

Volumn 87, Issue 4, 2010, Pages 614-619

  Lüssem, Björn ^a   Karipidou, Zoi ^a   Schreiber, Akos ^a   Yasuda, Akio ^a   Wessels, Jurina M ^a   Nelles, Gabriele ^a  

^a Sony Deutschland GmbH   (Germany)

Author keywords

Nano imprint lithography; Nanopatterning; Optical lithography; Organic and molecular devices; Printing

Indexed keywords

BACKING LAYERS; FEATURE SIZES; HIGH INTEGRATION DENSITY; HIGHLY INTEGRATED; METALLIC ELECTRODES; METALLIC FEATURE; MOLECULAR DEVICE; NANOPATTERNING; OPTICAL LITHOGRAPHY; ORGANIC AND MOLECULAR DEVICES; ORGANIC DEVICES; ORGANIC LAYERS; PRINTING TECHNIQUES; PRINTING TECHNOLOGIES; REPRODUCIBILITIES; SACRIFICIAL LAYER; TARGET-SUBSTRATE;

ELECTRODES; PHOTOLITHOGRAPHY; PRINTING;

NANOIMPRINT LITHOGRAPHY;

EID: 75149165989     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.08.023     Document Type: Article

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