Formation of aligned silicon-nanowire on silicon in aqueous HF/(AgNO 3 + Na 2 S 2 O 8 ) solution

Applied Surface Science

Volumn 254, Issue 22, 2008, Pages 7219-7222

  Douani, R ^a   Hadjersi, T ^b   Boukherroub, R ^c   Adour, L ^a   Manseri, A ^b  

^a UNIVERSITÉ MOULOUD MAMMERI   (Algeria)

^b L'Unite de Developpement de la Technologie du Silicium   (Algeria)

^c INSTITUT D ELECTRONIQUE   (France)

Author keywords

Electroless etching; Nanostructures; Silicon nanowires

Indexed keywords

ETCHING; HYDROFLUORIC ACID; NANOSTRUCTURES; NANOWIRES; PHOTOLUMINESCENCE; SCANNING ELECTRON MICROSCOPY; SILICON; SODIUM COMPOUNDS;

ELECTROLESS ETCHINGS; ENERGY DISPERSIVE X-RAY; FORMATION PROCESS; ORIENTED SILICON; PEAK INTENSITY; ROOM-TEMPERATURE PHOTOLUMINESCENCE; SI SUBSTRATES; SILICON NANOWIRES;

SILVER COMPOUNDS;

EID: 50949116867     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.05.269     Document Type: Article

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