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Japanese Journal of Applied Physics

Volumn 48, Issue 11, 2009, Pages

Electrostatic-actuated suspended ribbon structure fabricated in single-crystalline SiC by selective photoelectrochemical etching

(4) Suda, Jun a Watanabe, Naoki a Fukunaga, Katsuhiko a Kimoto, Tsunenobu a

a KYOTO UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BASE PLATES; ELECTRICAL CONNECTION; ELECTRICAL ISOLATION; PHOTOELECTROCHEMICAL ETCHING; RIBBON STRUCTURES; SINGLE-CRYSTALLINE;

CRYSTALLINE MATERIALS; ELECTRIC CONNECTORS; ELECTROSTATICS; ION BOMBARDMENT; ION IMPLANTATION; PLATES (STRUCTURAL COMPONENTS); SILICON CARBIDE;

REACTIVE ION ETCHING;

EID: 73849125639 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.48.111101 Document Type: Article

Times cited : (2)

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