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Volumn 71, Issue 1, 1997, Pages 90-92

Ionization rates and critical fields in 4H silicon carbide

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0002622512     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.119478     Document Type: Article
Times cited : (393)

References (10)
  • 7
    • 0005528239 scopus 로고
    • edited by R.K. Willardson and A.S. Beer Academic, New York
    • F. Capasso, in Semiconductors and Semimetals, edited by R.K. Willardson and A.S. Beer (Academic, New York, 1985), Vol. 22, p. 5.
    • (1985) Semiconductors and Semimetals , vol.22 , pp. 5
    • Capasso, F.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.