Giant growth of single crystalline Ge on insulator by seeding lateral liquid-phase epitaxy

Thin Solid Films

Volumn 518, Issue 6 SUPPL. 1, 2010, Pages

  Tanaka, T ^a   Tanaka, M ^a   Itakura, M ^a   Sadoh, T ^a   Miyao, M ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

Ge on insulator; Liquid phase epitaxy; LSI

Indexed keywords

CRYSTAL QUALITIES; DEFECT-FREE; GE ON INSULATORS; GROWTH FRONT; HIGH QUALITY; LATERAL DIFFUSION; MICRO-PROBE RAMAN; SI ATOMS; SI(1 0 0); SINGLE-CRYSTALLINE; SOLIDIFICATION TEMPERATURE; TRANSMISSION ELECTRON MICROSCOPY OBSERVATION;

CRYSTAL GROWTH; CRYSTALLINE MATERIALS; GERMANIUM; LIQUIDS; LSI CIRCUITS; SILICON; THERMAL GRADIENTS; THERMOANALYSIS; TRANSMISSION ELECTRON MICROSCOPY;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 73649125501     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.10.081     Document Type: Article

References (17)

1. Miyao M., Murakami E., Etoh H., Nakagawa K., and Nishida A. J. Cryst. Growth 111 (1991) 912
2. Miyao M., and Nakagawa K. Jpn. J. Appl. Phys. 33 (1994) 3791
3. Taradchi G., Pitera A.J., and Fitzgerald E.A. Solid-State Electron. 48 (2004) 1297
4. Huang C.H., Yang M.Y., Chin A., Chen W.J., Zhu C.X., Cho B.J., Li M.-F., and Kwong D.L. Symposium on VLSI Technology, Digest of Technical Papers (2003) 119
5. Nakaharai S., Tezuka T., Sugiyama N., Moriyama Y., and Takagi S. Appl. Phys. Lett. 83 (2003) 3516
6. Kanno H., Toko K., Sadoh T., and Miyao M. Appl. Phys. Lett. 89 (2006) 182120
7. Toko K., Kanno H., Kenjo A., Sadoh T., Asano T., and Miyao M. Appl. Phys. Lett. 91 (2007) 042111
8. Liu Y., Deal M.D., and Plummer D. Appl. Phys. Lett. 84 (2004) 2563
9. Tweet D.J., Lee J.J., Maa J.S., and Hsu S.T. Appl. Phys. Lett. 87 (2005) 141908
10. Gao F., Lee S.J., Balakumar S., Du A., Foo Y.-L., and Kwong D.-L. Thin Solid Films 504 (2006) 69
11. Balakumar S., Roy M.M., Ramamurthy B., Tung C.H., Fei G., Tripathy S., Dongzhi C., Kumar R., Balasubramanian N., and Kwog D.L. Electrochemical and Solid-State Lett. 9 (2006) G158
12. Tamura M., Tamura H., Miyao M., and Tokuyama T. Jpn. J. Appl. Phys. 20 20-1 (1981) 43
13. Takai M., Tanigawa T., Miyauchi M., Nakashima S., Gamo K., and Namba S. Jpn. J. Appl. Phys. 23 (1984) L363
14. Miyao M., Tanaka T., Toko K., and Tanaka M. Appl. Phys. Express 2 (2009) 045503
15. Mooney P.M., Dacol F.H., Tsang J.C., and Chu J.O. Appl. Phys. Lett. 62 (1993) 26
16. Chen H., Li Y.K., Peng C.S., Liu H.F., Liu Y.L., Huang Q., and Zhou J.M. Phys. Rev. B 65 (2002) 233303
17. Hirashita N., Nakaharai S., Moriyama Y., Usuda K., Tezuka T., Sugiyama N., and Takagi S. Thin Solid Films 517 (2008) 407