Ni-imprint induced solid-phase crystallization in Si1-xGe x (x: 0-1) on insulator

Applied Physics Letters

Volumn 91, Issue 4, 2007, Pages

  Toko, Kaoru ^a   Kanno, Hiroshi ^a   Kenjo, Atsushi ^a   Sadoh, Taizoh ^a   Asano, Tanemasa ^a   Miyao, Masanobu ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSIS; CRYSTAL GROWTH; CRYSTALLIZATION; NICKEL COMPOUNDS; NUCLEATION;

GROWTH VELOCITY; NI-IMPRINT TECHNIQUE; SOLID-PHASE CRYSTALLIZATION;

SILICON ON INSULATOR TECHNOLOGY;

EID: 34547441988     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2764447     Document Type: Article

References (13)

1. M. Miyao, T. Sadoh, S. Yamaguchi, and S. K. Park, Tech. Rep. IEICE. SDM 101, 1 (2001).
2. S. Yamaguchi, N. Sugii, S. K. Park, K. Nakagawa, and M. Miyao, J. Appl. Phys. 89, 2091 (2001).
3. J. Olivares, A. Rodriguez, J. Sangrador, T. Rodriguez, C. Ballesteros, and A. Kling, Thin Solid Films 337, 51 (1999).
4. M. Miyao, I. Tsunoda, T. Sadoh, and A. Miyauchi, J. Appl. Phys. 97, 054909 (2005).
5. C. Hayzelden and J. L. Bastone, J. Appl. Phys. 73, 8279 (1993).
6. H. Kanno, A. Kenjo, T. Sadoh, and M. Miyao, Appl. Phys. Lett. 85, 899 (2004).
7. H. Kanno, A. Kenjo, T. Sadoh, and M. Miyao, Jpn. J. Appl. Phys., Part 1 45, 4351 (2006).
8. H. Kanno, I. Tsunoda, A. Kenjo, T. Sadoh, and M. Miyao, Appl. Phys. Lett. 82, 2148 (2003).
9. H. Kanno, K. Toko, T. Sadoh, and M. Miyao, Appl. Phys. Lett. 89, 182120 (2006).
10. K. Makihira and T. Asano, Appl. Phys. Lett. 76, 3774 (2000).
11. L. Csepregi, E. F. Kennedy, J. W. Mayer, and T. W. Sigmon, J. Appl. Phys. 49, 3906 (1978).
12. L. Csepregi, R. P. Kullen, J. W. Mayer, and T. W. Sigmon, Solid State Commun. 21, 1019 (1977).
13. M. Bauer, M. Oehme, M. Sauter, G. Eifler, and E. Kasper, Thin Solid Films 364, 228 (2000).