Structural and electrical properties of as-deposited and annealed DC sputtered ITO thin films

EPJ Applied Physics

Volumn 1, Issue 2, 1998, Pages 177-180

  Kerkache, L ^a   Sadaoui, K ^a   Layadi, A ^a  

^a FERHAT ABBAS UNIVERSITY   (Algeria)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ARGON; ELECTRIC RESISTANCE; GRAIN SIZE AND SHAPE; OXIDES; SPUTTERING; THIN FILMS; TIN;

INDIUM COMPOUNDS;

EID: 0031651522     PISSN: 12860042     EISSN: None     Source Type: Journal    
DOI: 10.1051/epjap:1998102     Document Type: Article

References (11)

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