|
Volumn 404, Issue 22, 2009, Pages 4359-4363
|
Nanointegration of ZnO with Si and SiC
|
Author keywords
Crystal growth; Heteroepitaxy; Nanopillars; p n junction; ZnO
|
Indexed keywords
4H-SIC SUBSTRATE;
CATALYST-FREE;
CONTROLLED GROWTH;
EPITAXIAL RELATIONSHIPS;
FIELD EMISSION PROPERTY;
FIELD EMITTER;
GROWN STRUCTURES;
HETEROEPITAXIAL GROWTH;
HETEROEPITAXY;
LOW CONCENTRATIONS;
MATRIX;
MICROPHOTOLUMINESCENCE;
MOCVD;
NANO-SIZED;
NANOPILLARS;
NANOSCALED;
NATIVE DEFECT;
NEAR BAND EDGE EMISSIONS;
OPTICAL EMISSIONS;
P-N JUNCTION;
P-TYPE;
SELF ORGANIZED GROWTH;
SIC SUBSTRATES;
SPATIAL UNIFORMITY;
SUBLIMATION EPITAXY;
ZNO;
ZNO NANOSTRUCTURES;
ZNO ON SI;
ZNO SINGLE CRYSTALS;
ZNO STRUCTURES;
CHEMICAL VAPOR DEPOSITION;
CRYSTALLIZATION;
FIELD EMISSION;
GRAIN BOUNDARIES;
HETEROJUNCTION BIPOLAR TRANSISTORS;
LIGHT EMISSION;
SEMICONDUCTING SILICON COMPOUNDS;
SEMICONDUCTING ZINC COMPOUNDS;
SEMICONDUCTOR JUNCTIONS;
SILICON;
SILICON CARBIDE;
SINGLE CRYSTALS;
STOICHIOMETRY;
SUBSTRATES;
SULFUR COMPOUNDS;
TRANSMISSION ELECTRON MICROSCOPY;
ZINC OXIDE;
EPITAXIAL GROWTH;
|
EID: 71749108477
PISSN: 09214526
EISSN: None
Source Type: Journal
DOI: 10.1016/j.physb.2009.09.032 Document Type: Article |
Times cited : (8)
|
References (27)
|