Large area interference lithography using a table-top extreme ultraviolet laser: A systematic study of the degree of mutual coherence

Nanotechnology

Volumn 20, Issue 11, 2009, Pages

  Zuppella, P ^a   Luciani, D ^a   Tucceri, P ^a   De Marco, P ^a   Gaudieri, A ^a   Kaiser, J ^b   Ottaviano, L ^a   Santucci, S ^a   Reale, A ^a  

^a UNIVERSITY OF L'AQUILA   (Italy)

^b BRNO UNIVERSITY OF TECHNOLOGY   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

CAPILLARY-DISCHARGE LASERS; EXTREME ULTRAVIOLET LASERS; INTERFERENCE LITHOGRAPHIES; LOW COSTS; MUTUAL COHERENCES; POLYMETHYLMETHACRYLATE; PULSE DURATIONS; REGULAR PATTERNS; RESOLUTION LIMITS; SYSTEMATIC STUDIES; TABLE TOPS;

MIRRORS; PHOTOLITHOGRAPHY;

PULSED LASER APPLICATIONS;

ARGON; NANOMATERIAL; POLY(METHYL METHACRYLATE);

ARTICLE; LIGHT EXPOSURE; NANOFABRICATION; NANOTECHNOLOGY; PHYSICAL PARAMETERS; PITCH; PRIORITY JOURNAL; PULSE RATE; RADIATION DOSE; ULTRAVIOLET RADIATION;

EID: 65449177698     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/11/115303     Document Type: Article

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