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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 27, Issue 6, 2009, Pages 1255-1259

Analysis of controlled mixed-phase (amorphous+microcrystalline) silicon thin films by real time spectroscopic ellipsometry

(5) Podraza, N J a Li, Jing b Wronski, C R a Dickey, E C b Collins, R W c

a The Pennsylvania State University (United States)

b PENNSYLVANIA STATE UNIVERSITY (United States)

c UNIVERSITY OF TOLEDO (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DARK-FIELD TRANSMISSION ELECTRON MICROSCOPY; DEPOSITION CONDITIONS; HOST MATRICES; HYDROGEN DILUTION; HYDROGENATED AMORPHOUS SILICON; IN-SITU; KEY TECHNIQUES; MICRO CRYSTALLITE; PERIODIC ARRAYS; PHASE EVOLUTIONS; REAL TIME SPECTROSCOPIC ELLIPSOMETRY; SILICON THIN FILM; THIN-FILM PHOTOVOLTAIC DEVICES;

AMORPHOUS FILMS; DEPOSITION; FILM PREPARATION; HYDROGENATION; MICROCRYSTALLINE SILICON; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON COMPOUNDS; SILANES; SPECTROSCOPIC ANALYSIS; SPECTROSCOPIC ELLIPSOMETRY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

AMORPHOUS SILICON;

EID: 71049145297 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.3212893 Document Type: Article

Times cited : (17)

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