Subsurface damage measurement of ground fused silica parts by HF etching techniques

Optics Express

Volumn 17, Issue 22, 2009, Pages 20448-20456

  Neauport, J ^a   Ambard, C ^a,b   Cormont, P ^a   Darbois, N ^a   Destribats, J ^a   Luitot, C ^c   Rondeau, O ^b  

^a CEA CESTA   (France)

^b CEA LE RIPAULT   (France)

^c NONE

Author keywords

[No Author keywords available]

Indexed keywords

DAMAGE DETECTION; ETCHING; HIGH POWER LASERS; LASER APPLICATIONS; SILICA;

CHARACTERIZATION TECHNIQUES; DAMAGE THRESHOLD; FUSED SILICA OPTICS; HF ETCHING; MEASUREMENT-BASED; OPTICAL SURFACES; SUB-SURFACE DAMAGE; SUBSURFACE DAMAGES;

FUSED SILICA;

HYDROFLUORIC ACID; SILICON DIOXIDE;

ARTICLE; CHEMISTRY; LASER; MATERIALS TESTING; METHODOLOGY; SURFACE PROPERTY;

HYDROFLUORIC ACID; LASERS; MATERIALS TESTING; SILICON DIOXIDE; SURFACE PROPERTIES;

EID: 70749144789     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.17.020448     Document Type: Article

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