Laser-induced damage of fused silica at 355 nm initiated at scratches

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3244, Issue , 1997, Pages 341-347

  Salleo, A ^a   Genin F Y ^a   Yoshiyama, J ^a   Stolz, C J ^a   Kozlowski, M R ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

355 nm; Cracks; Fused silica; Laser induced damage threshold; Light intensification; Scratches

Indexed keywords

BRITTLENESS; CRACKS; ELECTRIC FIELD EFFECTS; LASER DAMAGE; LASER PULSES; ULTRAVIOLET RADIATION;

SCRATCH MORPHOLOGIES;

FUSED SILICA;

EID: 0031289898     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.307039     Document Type: Conference Paper

References (19)

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