Inductively coupled plasma etching in fabrication of 2D InP-based photonic crystals

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 27, Issue 3, 2009, Pages 1093-1096

  Wang, Hailing ^a   Xing, Mingxin ^a   Ren, Gang ^a   Zheng, Wanhua ^a,b  

^a INSTITUTE OF SEMICONDUCTORS   (China)

^b NONE   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CYLINDERS (SHAPES); ETCHING; INDUCTIVELY COUPLED PLASMA; LASER OPTICS;

CYLINDRICAL HOLES; HIGH ETCH RATE; INP; SURFACE-EMITTING PHOTONIC CRYSTALS;

PHOTONIC CRYSTALS;

EID: 70450193192     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3125268     Document Type: Conference Paper

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