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Volumn 22, Issue 2, 2004, Pages 707-709
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Fabrication of two-dimensional InP-based photonic crystals by chlorine based chemically assisted ion beam etching
b
EPFL
(Switzerland)
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Author keywords
[No Author keywords available]
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Indexed keywords
CHLORINE;
CRYSTAL ORIENTATION;
CRYSTALS;
ELECTRON BEAM LITHOGRAPHY;
ENERGY GAP;
ETCHING;
ION BEAMS;
LIGHT TRANSMISSION;
METALLORGANIC VAPOR PHASE EPITAXY;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTOR QUANTUM WELLS;
WAVEGUIDES;
CAVITY QUALITY FACTORS;
CHEMICALLY ASSISTED ION BEAM ETCHING (CAIBE);
PHOTONIC BAND GAPS;
PHOTONIC CRYSTALS (PHC);
SEMICONDUCTING INDIUM PHOSPHIDE;
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EID: 2342466114
PISSN: 10711023
EISSN: None
Source Type: Journal
DOI: 10.1116/1.1688353 Document Type: Article |
Times cited : (31)
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References (10)
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