Non-lithographic nanopatterning of InGaN/GaN multiple quantum well nanopillars by focused ion beams

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 5, Issue 6, 2008, Pages 2186-2188

  Wu, S E ^a   Hsueh, T H ^a   Liu, C P ^a   Sheu, J K ^a   Lai, W C ^a   Chang, S J ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AS-GROWN; BLUE SHIFT; DEFOCUSING; FABRICATION TECHNIQUE; FOCUSED ION BEAM MILLING; HIGH ASPECT RATIO; INGAN/GAN; MASK LESS; METAL-ORGANIC; MULTIPLE QUANTUM WELLS; NANO-PILLAR ARRAYS; NANOPATTERNING; NANOPILLARS; NEW APPROACHES; ROOM TEMPERATURE; SHAPE TUNING; STRUCTURAL AND OPTICAL PROPERTIES; VAPOUR DEPOSITION;

ASPECT RATIO; FABRICATION; FOCUSED ION BEAMS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; IONS; LIGHT EMITTING DIODES; LIGHT TRANSMISSION; NITRIDES; OPTICAL PROPERTIES; ORGANIC CHEMICALS; ORGANIC LIGHT EMITTING DIODES (OLED); SCANNING ELECTRON MICROSCOPY; TUNING; YTTERBIUM COMPOUNDS;

SEMICONDUCTOR QUANTUM WELLS;

EID: 70450077610     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.200778529     Document Type: Conference Paper

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