Highly reliable and extremely stable sige micro-mirrors

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2007, Pages 759-762

  Gromova, M ^a,b   Haspeslagh, L ^a   Verbist, A ^a   Du Bois, B ^a   Van Hoof, R ^a   Eyckens, B ^a   Sijmus, B ^a   De Wolf, I ^a   Simons, V ^a   Muller, Ph ^a   Lauwagie, T ^a   Willegems, M ^a   Locorotondo, S ^a   Boullart, W ^a   Baert, K ^a   Witvrouw, A ^a  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

MIRRORS; SI-GE ALLOYS;

MICRO MIRROR; STANDARD CMOS; SUBMICRON;

MEMS;

EID: 50149106985     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/memsys.2007.4433173     Document Type: Conference Paper

References (6)

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4. M. Gromova et al., "The novel use of low temperature μc-SiGe:H for MEMS applications", Microelectronics Journal, Vol. 76 (1-4), pp. 266-271, 2004.
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6. J. Yang et al., "A new technique for producing large-area as-deposited zero-stress LPCVD polysilicon films: The Multipoly process", J. Microelectromech. Syst., Vol. 9(4), pp 485-494, 2000.