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Volumn , Issue , 2007, Pages 39-42

A 10 μm thick poly-SiGe gyroscope processed above 0.35 μ CMOS

Author keywords

CMOS; Gyroscope; Monolithic integration; SiGe; Silicon germanium

Indexed keywords

COMPOSITE MICROMECHANICS; MECHANICAL ENGINEERING; MECHANICS; MECHATRONICS; MEMS; MICROELECTROMECHANICAL DEVICES; MONOLITHIC INTEGRATED CIRCUITS; POLYSILICON;

EID: 52149101191     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (24)

References (5)
  • 1
    • 27544443816 scopus 로고    scopus 로고
    • Optimisation of PECVD poly-SiGe layers for MEMS post-processing on top of CMOS
    • A. Mehta, M. Gromova, P. Czarnecki, K. Baert, A. Witvrouw, "Optimisation of PECVD poly-SiGe layers for MEMS post-processing on top of CMOS" Proc. Transducers 2005, Vol.2, pp. 1326-1329, 2005.
    • (2005) Proc. Transducers , vol.2 , pp. 1326-1329
    • Mehta, A.1    Gromova, M.2    Czarnecki, P.3    Baert, K.4    Witvrouw, A.5
  • 2
    • 27544458906 scopus 로고    scopus 로고
    • Processing of MEMS gyroscopes on top of CMOS ICs
    • A. Witvrouw et al., "Processing of MEMS gyroscopes on top of CMOS ICs" Proc. ISSCC 2005, p 88-89 (2005).
    • (2005) Proc. ISSCC 2005 , pp. 88-89
    • Witvrouw, A.1
  • 3
    • 0742304004 scopus 로고    scopus 로고
    • New low-stress PECVD poly-SiGe Layers for MEMS
    • C. Rusu et al., "New low-stress PECVD poly-SiGe Layers for MEMS" J. MEMS, Vol. 12 (6), pp. 816-825, 2003.
    • (2003) J. MEMS , vol.12 , Issue.6 , pp. 816-825
    • Rusu, C.1
  • 4
    • 0036913170 scopus 로고    scopus 로고
    • Single-Chip Surface Micromachined Integrated Gyroscope with 50°/hour Root Allan Variance
    • December
    • J. A. Geen, S. J. Sherman, J. F. Chang, S. R. Lewis "Single-Chip Surface Micromachined Integrated Gyroscope with 50°/hour Root Allan Variance", IEEE Journal of Solid-State Circuits, vol. 37, No. 12, December 2002
    • (2002) IEEE Journal of Solid-State Circuits , vol.37 , Issue.12
    • Geen, J.A.1    Sherman, S.J.2    Chang, J.F.3    Lewis, S.R.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.