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Volumn 256, Issue 2, 2009, Pages 489-494

XPS study of annealing induced effects on surface and interface electronic properties of Si/Ge nanostructures

Author keywords

Annealing; Interdiffusion; Interface; Multilayers; XPS

Indexed keywords

ANNEALING; DEPTH PROFILING; ELECTRONIC PROPERTIES; INTERDIFFUSION (SOLIDS); INTERFACES (MATERIALS); MULTILAYERS; SURFACE TREATMENT; ULTRAHIGH VACUUM; VACUUM EVAPORATION;

EID: 70449090029     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.07.054     Document Type: Article
Times cited : (9)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.