Deposition of high quality amorphous silicon, germanium and silicon-germanium thin films by a hollow cathode reactive sputtering system

Surface and Coatings Technology

Volumn 177-178, Issue , 2004, Pages 676-681

  Soukup, R J ^a   Ianno, N J ^a   Pribil, G ^a   Hubicka, Z ^a,b  

^a UNIVERSITY OF NEBRASKA LINCOLN   (United States)

^b INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

Amorphous; Fourier transform infrared spectroscopy; Germanium; Reactive sputtering; Silicon

Indexed keywords

AMORPHOUS SILICON; CATHODES; COATING TECHNIQUES; CONCENTRATION (PROCESS); ENERGY GAP; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GERMANIUM; HYDROGENATION; MAGNETIC FIELD EFFECTS; SINGLE CRYSTALS;

HOLLOW CATHODE SYSTEMS;

THIN FILMS;

COATING;

EID: 1342310564     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2003.08.006     Document Type: Article

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