Interdiffusion in amorphous Si/Ge multilayers by Auger depth profiling technique

Journal of Applied Physics

Volumn 89, Issue 1, 2001, Pages 804-806

  Csik, A ^a   Langer, G A ^a   Beke, D L ^a   Erdelyi Z ^a   Menyhard, M ^b   Sulyok, A ^b  

^a UNIVERSITY OF DEBRECEN   (Hungary)

^b RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0008835181     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1331330     Document Type: Article

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