Nanopattern transfer from high-density self-assembled nanosphere arrays on prepatterned substrates

Nanotechnology

Volumn 20, Issue 45, 2009, Pages

  Oshima, Hirotaka ^a   Tamura, Hiroaki ^a   Takeuchi, Mitsuo ^a   Inomata, Akihiro ^a   Yanagida, Yoshiaki ^a   Matsushita, Naohisa ^a   Komoriya, Hitoshi ^a   Uzumaki, Takuya ^a   Tanaka, Atsushi ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CAPILLARY FORCE; DIP COATING TECHNIQUES; ETCHING MASKS; HIGH-DENSITY; MASK LAYER; NANO PATTERN; NANO-DOT ARRAYS; NANO-IMPRINT; NANO-PATTERN TRANSFER; NANODOTS; PATTERN TRANSFER PROCESS; PATTERN TRANSFERS; PATTERNED SUBSTRATES; POLYMER SURFACES; SELF-ASSEMBLED; SELF-ASSEMBLING; SILICA NANOSPHERES; SILICA SUBSTRATE; UV-NANOIMPRINT;

ASPECT RATIO; MOLDS; NANOSPHERES; REACTIVE ION ETCHING; SILICA;

SUBSTRATES;

NANOSPHERE; QUANTUM DOT; RUTHENIUM; SILICON DIOXIDE;

ARTICLE; HYDROPHILICITY; HYDROPHOBICITY; MOULD; PRIORITY JOURNAL; SCANNING ELECTRON MICROSCOPY; TOPOGRAPHY; ULTRAVIOLET RADIATION;

EID: 70350605651     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/45/455303     Document Type: Article

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