|
Volumn 6, Issue SUPPL. 2, 2009, Pages
|
Evaluation of SiN films for AlGaN/GaN MIS-HEMTs on Si(111)
a
CRHEA CNRS
(France)
|
Author keywords
[No Author keywords available]
|
Indexed keywords
ALUMINUM GALLIUM NITRIDE;
CAPACITANCE;
DIELECTRIC FILMS;
GALLIUM NITRIDE;
III-V SEMICONDUCTORS;
INDIUM PHOSPHIDE;
INTERFACES (MATERIALS);
MIS DEVICES;
PLASMA CVD;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SEMICONDUCTING INDIUM PHOSPHIDE;
SILICON NITRIDE;
ALGAN/GAN MIS-HEMTS;
CAPACITANCE VOLTAGE;
CURRENT VOLTAGE MEASUREMENT;
DEPOSITION CONDITIONS;
DIELECTRIC LAYER;
INTERFACE FORMATION;
REFERENCE DEVICES;
SI(111) SUBSTRATE;
X RAY PHOTOELECTRON SPECTROSCOPY;
|
EID: 70350128868
PISSN: 18626351
EISSN: 16101642
Source Type: Journal
DOI: 10.1002/pssc.200880870 Document Type: Article |
Times cited : (7)
|
References (11)
|