Optimized SiO2/InP structures prepared by electron cyclotron resonance plasma

Journal of Applied Physics

Volumn 80, Issue 5, 1996, Pages 3100-3109

  Besland, M P ^a   Jourba, S ^a   Lambrinos, M ^a   Louis, P ^a   Viktorovitch, P ^a   Hollinger, G ^a  

^a ECOLE CENTRALE DE LYON   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012749645     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363120     Document Type: Article

References (24)

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