Structural and optical properties of γ-mo2n thin films deposited by dc reactive magnetron sputtering

International Journal of Modern Physics B

Volumn 23, Issue 23, 2009, Pages 4817-4823

  Atuchin, V V ^a   Khasanov, T ^a   Kochubey, V A ^a   Pokrovsky, L D ^a   Gavrilova, T A ^b  

^a INSTITUTE OF SEMICONDUCTOR PHYSICS   (Russian Federation)

^b INSTITUTE OF SEMICONDUCTOR PHYSICS   (Russian Federation)

Author keywords

Ellipsometry; Magnetron sputtering; Molybdenum nitride; Optical parameters; RHEED

Indexed keywords

EID: 70349911612     PISSN: 02179792     EISSN: None     Source Type: Journal    
DOI: 10.1142/S0217979209053813     Document Type: Article

References (29)

1. J.-C. Chuang, S.-L. Tu and M.-C. Chen, Thin Solid Films 346, 299 (1999).
2. P. Alen, M. Ritala, K. Arstila, J. Keinonen and M. Leskela, J. Electrochem. Soc. 152, G361 (2005).
3. J.-Y. Tewg, Y. Kuo and J. Lu, J. Electrochem. Soc. 152, G643 (2005).
4. B.-Y. Tsui, C.-F. Huang and C.-H. Lu, J. Electrochem. Soc. 153, G197 (2006).
5. P. Hones, N. Martin, M. Regula and F. Levy, J. Phys. D Appl. Phys. 36, 1023 (2003).
6. W. Gulbinski and T. Suszko, Surf. Coat. Technol. 201, 1469 (2006).
7. N. Savvides, J. Appl. Phys. 62, 600 (1987).
8. Y. H. Shi, B. R. Zhao, Y. Y. Zhao, L. Li and J. R. Liu, Phys. Rev. B 38, 4488 (1988).
9. K. Inumaru, K. Baba and S. Yamanaka, Chem. Mater. 17, 5935 (2005).
10. K. Inumaru, K. Baba and S. Yamanaka, Phys. Rev. B 73, 052504 (2006).
11. K. Saito and Y. Asada, J. Phys. F Met. Phys. 17, 2273 (1987).
12. R. Fix, R. G. Gordon and D. M. Ho man, Thin Solid Films 288, 116 (1996).
13. S. L. Roberson, D. Finello and R. F. Davis, Surf. Coat. Technol. 102, 256 (1998).
14. A. Yu. Ganin, L. Kienle and G. V. Vajenine, J. Solid State Chem. 179, 2339 (2006).
15. M. Nagae, T. Yoshio, Y. Takemoto and J. Takada, J. Am. Ceram. Soc. 84, 1175 (2001).
16. F. Shoji and S. Nagata, Jpn. J. Appl. Phys. 13, 1072 (1974).
17. K.-L. Lin and Y.-J. Ho, J. Vac. Sci. Technol. A 13, 2872 (1995).
18. Y. G. Shen and Y.-W. Mai, Mater. Sci. Eng. B 95, 222 (2002).
19. H. Kattelus, M. Ylonen and M. Blomberg, Fatigue Fract. Engng. Mater. Struct. 28, 743 (2005).
20. J.-Y. Lee, S.-R. Jeon and J.-W. Park, J. Mater. Sci. Lett. 15, 1495 (1996).
21. Y. G. Shen and Y.-W. Mai, Phil. Mag. Lett. 83, 125 (2003).
22. V. Miikkulainen, M. Suvanto and T. Pakkanen, Chem. Mater. 19, 263 (2007).
23. J.-Y. Lee and J.-W. Park, Jpn. J. Appl. Phys. 35, 4280 (1996).
24. J. Barbosa, L. Cunha, L. Rebouta, C. Moura, F. Vaz, S. Carvalho, E. Alves, E. Le Bourhis, P. H. Goudeau and J. P. Riviere, Thin Solid Films 494, 201 (2006).
25. R. A. Koshy, M. E. Graham and L. D. Marks, Surf. Coat. Technol. 202, 1123 (2007).
26. J. Lu, Y. Kuo, S. Chatterjee and J.-Y. Tewg, J. Vac. Sci. Techonol. B 24, 349 (2006).
27. A. V. Rzanov, C. C. Svitashev, L. V. Semenenko, V. K. Semenenko and V. K. Sokolov, Principles of Ellipsometry (Novosibirsk, Russia, 1979).
28. R. M. A. Azzam and N. M. Basshara, Ellipsometry and Polarized Light (North Holland, Amsterdam, 1984).
29. V. Miikkulainen, private communication, Ref. 22.