Effect of deposition conditions on the physical and electrical properties of reactive sputtered molybdenum nitride film

Journal of Materials Science Letters

Volumn 15, Issue 17, 1996, Pages 1495-1497

  Lee, Jeong Youb ^a   Jeon, Seok Ryong ^a   Park, Jong Wan ^a  

^a Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; ELECTRIC PROPERTIES; FILMS; FLOW OF FLUIDS; MAGNETRON SPUTTERING; MORPHOLOGY; PHASE TRANSITIONS; PHYSICAL PROPERTIES; STRESSES; SURFACES; X RAY DIFFRACTION;

MOLYBDENUM NITRIDE; SHEET RESISTANCE; STRESS MEASUREMENT SYSTEM;

NITRIDES;

EID: 0030241653     PISSN: 02618028     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF00625002     Document Type: Article

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