Crystallization-induced stress in reactively sputter-deposited molybdenum nitride thin films

Philosophical Magazine Letters

Volumn 83, Issue 2, 2003, Pages 125-133

  Shen, Y G ^a   Mai, Yiu Wing ^b  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^b UNIVERSITY OF SYDNEY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; CRYSTALLIZATION; ELECTRON DIFFRACTION; MAGNETRON SPUTTERING; MOLYBDENUM COMPOUNDS; SPUTTER DEPOSITION; STOICHIOMETRY; STRESS ANALYSIS; X RAY DIFFRACTION ANALYSIS;

ENERGY-FILTERED ELECTRON DIFFRACTION;

THIN FILMS;

EID: 0142216309     PISSN: 09500839     EISSN: None     Source Type: Journal    
DOI: 10.1080/0950083021000056623     Document Type: Article

References (15)

1. BRANTLEY, W. A., 1973, J. appl. Phys., 44, 534.
2. COCKAYNE, D. J. H., and MCKENZIE, D. R., 1988, Acta crystallogr., 44, 870.
3. EGERTON, R. F., 1996, Electron Energy Loss Spectroscopy in the Electron Microscope, second edition (New York: Plenum).
4. KATTELUS, H., KOSKENALA, J., NURMELA, A., and NISKANEN, A., 2002, Microelectron. Engng, 60, 97.
5. KLABUNDE, F., LÖHMANN, M., BLÄAING, J., and DRÜSEDAU, T., 1996, J. appl. Phys., 80, 6266.
6. MCKENZIE, D. R., Muller, D. A., and PAILTHORPE, B. A., 1991, Phys. Rev. Lett., 67, 773.
7. NAKAJIMA, T., and SHIRASAKI, T., 1997, J. electrochem. Soc., 144, 2096.
8. ROBERSON, S. L., FINELLO, D., and DAVIS, R. F., 1998, Surf. Coatings Technol., 102, 256.
9. SHEN, Y. G., and MAI, Y. W., 2000, Appl. Surf. Sci., 167, 59.
10. SHEN, Y. G., MAI, Y. W., MCKENZIE, D. R., ZHANG, Q. C., MCFALL, W. D., and MCBRIDE, W. E., 2000a, J. appl. Phys., 88, 1380.
11. SHEN, Y. G., MAI, Y. W., ZHANG, Q. C., MCKENZIE, D. R., MCFALL, W. D., and MCBRIDE, W. E., 2000b, J. appl. Phys., 87, 177.
12. STONEY, G. C., 1909, Proc. R. Soc. A, 32, 1191.
13. TOTH, L. E., 1971, Transition Metal Carbides and Nitrides (New York: Academic Press).
14. WARD, R., and WOOD, B. J., 1992, Surf. Interface Anal., 18, 679.
15. WILSON, A. J. C. (editor), 1995, International Tables for Crystallography, Vol. C (Dordrecht: Kluwer).