Time-of-flight analysis and modeling of photochemical hydrogen desorption from silicon (111) with an F2 laser

Surface Science

Volumn 433-435, Issue , 1999, Pages 74-78

  Pusel, A ^a   Hess, P ^a  

^a UNIVERSITY OF HEIDELBERG   (Germany)

Author keywords

Laser methods; Photochemistry; Photon stimulated desorption (PSD); Si(111) (1 1):H

Indexed keywords

CALCULATIONS; DESORPTION; FINITE DIFFERENCE METHOD; HEATING; HYDROGEN; IRRADIATION; LASER APPLICATIONS; PHOTOCHEMICAL REACTIONS; SILICON;

MOLECULAR HYDROGEN; PHOTON STIMULATED DESORPTION; PHOTOTHERMAL DESORPTION; PULSE LASER IRRADIATION; TIME OF FLIGHT ANALYSIS; TRANSIENT SURFACE HEATING;

SURFACE PHENOMENA;

EID: 0033329009     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(99)00072-2     Document Type: Article

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