Development of metal nanocluster ion source based on dc magnetron plasma sputtering at room temperature

Review of Scientific Instruments

Volumn 80, Issue 9, 2009, Pages

  Majumdar, Abhijit ^a   Köpp, Daniel ^a   Ganeva, Marina ^a   Datta, Debasish ^b   Bhattacharyya, Satyaranjan ^b   Hippler, Rainer ^a  

^a UNIVERSITY OF GREIFSWALD   (Germany)

^b SAHA INSTITUTE OF NUCLEAR PHYSICS   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CHILLED WATER; CONSTANT MASS; COST EFFECTIVE; DEPOSITION CHAMBERS; MAGNETRON DISCHARGES; MAGNETRON PLASMA SPUTTERING; METAL NANOCLUSTERS; MULTIPLE SUBSTRATES; PULSED-DC DISCHARGE; QUADRUPOLE MASS FILTERS; ROOM TEMPERATURE; SELECTED METALS; SI(1 0 0); TARGET MATERIALS; WAFER TEMPERATURE;

ION SOURCES; MAGNETRONS; METAL RECOVERY; NANOCLUSTERS; PLASMAS; PRESSURE GRADIENT; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS;

IONS;

EID: 70349664362     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3213612     Document Type: Article

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