Microstructural and chemical evolution of -C H3 -incorporated (Low- k) SiCO(H) films prepared by dielectric barrier discharge plasma

Journal of the Electrochemical Society

Volumn 155, Issue 1, 2008, Pages

  Majumdar, Abhijit ^a   Das, Gobind ^b,d   Patel, Nainesh ^b   Mishra, Puneet ^c   Ghose, Debabrata ^c   Hippler, Rainer ^a  

^a UNIVERSITY OF GREIFSWALD   (Germany)

^b UNIVERSITY OF TRENTO   (Italy)

^c SAHA INSTITUTE OF NUCLEAR PHYSICS   (India)

^d UNIVERSITY MAGNA GRAECIA OF CATANZARO   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTRA; ELECTRIC DISCHARGES; MICROSTRUCTURAL EVOLUTION; PERMITTIVITY; VIBRATIONAL SPECTRA;

DISCHARGE PLASMA METHOD; FILM ROUGHNESS; VIBRATIONAL BAND RATIO; VIBRATIONAL BANDS;

SILICON COMPOUNDS;

EID: 36448973523     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2801345     Document Type: Article

References (22)

1. K. Maex, M. R. Baklanov, D. Shamiryan, F. Iacopi, S. H. Brongersma, and Z. S. Yanovitskaya, J. Appl. Phys., 93, 8793 (2003).
2. A. Grill and D. A. Neumayer, J. Appl. Phys., 94, 6697 (2003).
3. R. S. Brusa, M. Spagolla, G. P. Karwasz, A. Zecca, G. Ottaviani, F. Corni, M. Bacchetta, and E. Carollo, J. Appl. Phys., 95, 2348 (2004).
4. G. Borcia, C. A. Anderson, and N. M. D. Brown, Surf. Coat. Technol., 201, 3074 (2006).
5. A. Sonnenfeld, T. M. Tun, L. Zajikova, K. M. Kozlov, H. E. Wagner, J. F. Behnke, and R. Hippler, Plasmas Polym., 6, 237 (2001).
6. O. Goosens, E. Dekempeneer, D. Vangeneugden, R. Van De Leest, and C. Leys, Surf. Coat. Technol., 142, 474 (2001).
7. S. Paulussen, R. Rego, O. Gossens, D. Vangeneugden, and K. Rose, J. Phys. D, 38, 568 (2005).
8. Y. H. Liu, J. Li, D. P. Liu, T. C. Ma, and G. Benstetter, Surf. Coat. Technol., 200, 5819 (2006).
9. P. Heyse, R. Dams, S. Paulussen, K. Houthoofd, K. Janssen, P. A. Jacobs, and B. F. Sels, Plasma Processes Polym., 4, 145 (2007).
10. A. Majumdar and R. Hippler, Rev. Sci. Instrum., 78, 075103 (2007).
11. A. Majumdar, J. F. Behnke, R. Hippler, K. Matyash, and R. Schneider, J. Phys. Chem. A, 109, 9371 (2005).
12. H. E. Wagner, R. Brandenburg, K. V. Kozlov, A. Sonnenfeld, P. Michel, and J. F. Behnke, Vacuum, 71, 417 (2003).
13. J. Heo and H. J. Kim, J. Electrochem. Soc., 153, F228 (2006).
14. M. R. Alexander, R. D. Short, F. R. Jones, W. Michaeli, and C. J. Blomfield, Appl. Surf. Sci., 137, 179 (1999).
15. E. Riedo, F. Comin, J. Chevrier, F. Schmithusen, S. Decossas, and M. Sancrotti, Surf. Coat. Technol., 125, 124 (2000).
16. A. Majumdar, J. Schäfer, P. Mishra, D. Ghose, J. Meichsner, and R. Hippler, Surf. Coat. Technol., 201, 6437 (2007).
17. L. M. Han, J. S. Pan, S. M. Chen, N. Balasubhramanium, J. Shi, L. S. Wong, and P. D. Foo, J. Electrochem. Soc., 148, F151 (2001).
18. X. Yan, T. Xu, G. Chen, S. Yang, H. Liu, and Q. Xue, J. Phys. D, 37, 907 (2004).
19. G. Socrates, Infrared Characteristic Group Frequencies, p. 186, John Wiley & Sons, Chichester (1994).
20. T. C. Chang, Y. S. Mor, P. T. Liu, T. M. Tsai, C. W. Chen, C. J. Chu, F. M. Pan, W. Lur, and S. M. Sze, J. Electrochem. Soc., 149, F145 (2002).
21. G. Das, G. Mariotto, and A. Quaranta, J. Electrochem. Soc., 153, F46 (2006).
22. M. E. Ramsey, E. Poindexter, J. S. Pelt, J. Marin, and S. M. Durbin, Thin Solid Films, 360, 82 (2000).