Evaluation of plasma damage in blanket and patterned low-k structures by near-field scanning probe microwave microscope: Effect of plasma ash chemistry

Proceedings of the 2009 IEEE International Interconnect Technology Conference, IITC 2009

Volumn , Issue , 2009, Pages 134-136

  Urbanowicz, A M ^a,b   Talanov, V V ^c   Pantouvaki, M ^a   Struyf, H ^a   De Gendt, S ^a,b   Baklanov, M R ^a  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

^c Solid State Measurements Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASH CHEMISTRY; DIELECTRIC CONSTANTS; ELEVATED TEMPERATURE; ELLIPSOMETRIC POROSIMETRY; FTIR; METALLIZATIONS; MICROWAVE MICROSCOPES; NEAR-FIELD SCANNING; PATTERNED STRUCTURE; PLASMA ASH; PLASMA DAMAGE; ROOM TEMPERATURE; SIDEWALL DAMAGE; WATER SOURCE;

FOURIER TRANSFORM INFRARED SPECTROSCOPY; MICROWAVES; PHOTORESISTORS; PLASMAS; PROBES; SURFACE TREATMENT;

PLASMA DIAGNOSTICS;

EID: 70349463103     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IITC.2009.5090363     Document Type: Conference Paper

References (12)

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