Effects of bias, pressure and temperature in plasma damage of ultra low-k films

Solid State Phenomena

Volumn 134, Issue , 2008, Pages 317-320

  Urbanowicz, A M ^a   Humbert, A ^b   Mannaert, G ^a   Tokei, Z ^a   Baklanov, M R ^a  

^a IMEC   (Belgium)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

Bias potential; Cleaning plasmas; Low k dielectrics; Plasma damage

Indexed keywords

EID: 38549102042     PISSN: 10120394     EISSN: 16629779     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/SSP.134.317     Document Type: Conference Paper

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