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Volumn 8, Issue 5, 2009, Pages 574-581

Fabrication and characterization of interconnected nanowell molecular electronic devices in crossbar architecture

Author keywords

Electrical contacts; Interconnected devices; Molecular electronics; Semiconductor device fabrication

Indexed keywords

BILAYER RESISTS; BOTTOM CONTACTS; CIRCUIT ARCHITECTURES; CONTACT LAYERS; CROSSBAR ARCHITECTURE; DEVICE ARCHITECTURES; DEVICE CHARACTERISTICS; DEVICE LAYERS; ELECTRICAL CONTACTS; EQUIVALENT CONDUCTIVITY; FACILE FABRICATION; FILAMENT FORMATION; INTERCONNECTED DEVICES; LOW CONDUCTIVITY; METAL CONTACTS; MICROELECTRONIC FABRICATION; MOLECULAR DEPOSITION; MOLECULAR DEVICE; MOLECULAR ELECTRONIC DEVICE; MOLECULAR JUNCTION; MOLECULAR LAYER; MOLECULAR MONOLAYER; MOLECULAR SIGNATURES; MOLECULAR TRANSPORT; NANOWELL; PARALLEL CONFIGURATION; PHASE DEPOSITION; POST-DEPOSITION; ROOM TEMPERATURE; SEMICONDUCTOR DEVICE FABRICATION; SHADOW MASK; TEMPERATURE DEPENDENT; TOP CONTACT; VAPOR PHASE; VAPOR PHASE DEPOSITION;

EID: 70349316556     PISSN: 1536125X     EISSN: None     Source Type: Journal    
DOI: 10.1109/TNANO.2009.2021161     Document Type: Article
Times cited : (9)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.