EUV lithography development and research challenges for the 22 nm half-pitch

Journal of Photopolymer Science and Technology

Volumn 22, Issue 1, 2009, Pages 31-42

  Wurm, Stefan ^a  

^a SEMATECH   (United States)

Author keywords

EUV; Lithography

Indexed keywords

EID: 70249097727     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.22.31     Document Type: Article

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