Protection efficiency of a standard compliant EUV reticle handling solution

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  He, Long ^a,c   Lystad, John ^b   Wurm, Stefan ^a   Orvek, Kevin ^a   Sohn, Jaewoong ^a   Ma, Andy ^c   Kearny, Patrick ^a   Kolbow, Steve ^b   Halbmaier, David ^b  

^a SEMATECH   (United States)

^b ENTEGRIS INC   (United States)

^c INTEL CORPORATION   (United States)

Author keywords

Defect; EUV mask; EUV reticle; EUV reticle handling; EUV reticle protection; EUVL

Indexed keywords

EUV MASK; EUV RETICLE; EUV RETICLE HANDLING; EUV RETICLE PROTECTION; EUVL;

DEFECTS; MASKS; OPTICAL INSTRUMENTS; POLYSTYRENES; SILICON COMPOUNDS; ULTRAVIOLET DEVICES;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 67149143169     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814304     Document Type: Conference Paper

References (18)

1. International Extreme Ultra-Violet Lithography (EUVL) Symposia, 2002-2008. The symposium materials can be found at http://www.sematech.org/ meetings/archives.htm.
2. SEMATECH EUVL Reticle-handling Work Shop, San Jose, CA, February 28, 2005. The workshop proceedings can be found at http://www.sematech.org/meetings/ archives.htm.
3. P. Yan, et al., Clean Mask Shipping Module Development and Demonstration for EUVL Masks and Blanks, SPIE Proc. Vol.6283, 62830M (2006). (Pubitemid 44300611)
4. L. He, et al., "Status of EUV reticle handling solution in meeting 32 nm hp EUV lithography," SPIE Proc. Vol.6921, 69211Z (2008).
5. L. He, et al., "Status and path to a final EUVL reticle-handling solution", SPIE Proc. Vol.6517, 651710 (2007).
6. J. Zimmerman, et al., "The progress of EUV reticle dual pod carriers for use in the fab and exposure tools," in ref [1] (2008).
7. F. Goodwin, et at., "Extreme Ultraviolet Lithography: Remaining Challenges for Pilot Line Introduction and Extendibility to Sub-22nm Patterning," to be published in MNC Proc. (2008).
8. M. Amemiya, et al., "Particle-free mask handling techniques and a dual-pod carrier," SPIE Proc. Vol.6921, 69213T (2008).
9. K. Ota, et al., "SELETE EUV reticle shipping and storage test results," SPIE Proc. Vol.7028, 702801 (2008).
10. SEMI Draft Document 4466B, "New Standard: Mechanical Specification OfEUV Pod For 150 mm EUVL Reticles,"
11. K. Ota, et al., "EUV Reticle Carrier: Joint Proposal and Current Status of Canon and Nikon," in ref [1] (2006).
12. D. Halbmaier, et al., "EUVL mask carrier system," in ref [1] (2006).
13. Y. Gomei, et al., EUVL mask dual pods to be used for mask shipping and handling in exposure tools, SPIE Vol. 6517, 65170W (2007). (Pubitemid 47550757)
14. B. Blum, "ASML frame and storage reticle handling approach," in ref [2] (2005).
15. K. Orvek, et al., "Concept Demonstration of Integrated Particle Defect Control of EUVL Masks," in ref [1] (2005).
16. P. Kearney et al., "Defect Mitigation and Reduction in EUVL Mask Blanks," in ref [1] (2006); and references therein.
17. K. Tsai, et al., "On the Sensitivity Improvement and Cross-correlation Methodology for Confocal EUV Mask Blank Defect Inspection Tool Fleet," BACUS Photomask Technology Conference, (2005).
18. J. Wang, et al., "Controlled Deposition of NIST-traceable Nanoparticles as Additional Size Standards for Photomask Applications," SPIE Proc. Vol.6922, 69220G (2008); and references therein.